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Keyword:plasma technology
Russia's Kurchatov Institute to Receive 5.7 Billion Rubles in Fiscal Budget Support: Focusing on Controlled Thermonuclear Fusion and Advanced Plasma Technology R&D
The National Research Centre "Kurchatov Institute" will receive approximately 5.7 billion Rubles in dedicated funding support from the Russian federal budget during the period from 2027 to 2029. This fiscal allocation will be specifically used to advance key technology breakthroughs in Controlled Thermonuclear Fusion, as well as the R&D and experimental validation of innovative Plasma Technologies. The above funding plan is explicitly stated in the draft explanatory document of the 2027–2029 federal budget bill published in the electronic database of the Russian State Duma...
2026-10-03
Iran Says Its Atomic Energy Organization's Medical Products Serve Over 1.5 Million Patients Annually
Mohammad Eslami, head of the Atomic Energy Organization of Iran, recently stated that more than 1.5 million patients in Iran use diagnostic and therapeutic products developed by the organization each year, and related medical products have also been exported to multiple countries. Eslami made these remarks at a ceremony held by Iran's nuclear industry to celebrate Physicians' Day. He said that promoting the application of advanced treatment methods is one of the key directions of Iran's scientific and technological development. The progress made by Iranian researchers in cold plasma technology has opened up a "brand-new and promising path" for medical applications. He stated that plasma technology has not only achieved notable results in the research field but has also played a role in healthcare settings.
2026-08-24
CNNC Innovation Multi-functional Surface Modification Device Shipped and Delivered
On August 14, 2026, the multi-functional surface modification device developed by CNNC Innovation (Chengdu) Technology Co., Ltd. (hereinafter referred to as "CNNC Innovation") was officially shipped and delivered. This multi-functional surface modification device utilizes CNNC Innovation's proprietary high-energy metal ion source, gas ion source, and supporting single-stage pulsed magnetron source power supply and DC-superimposed pulsed bias power supply. It can perform ion implantation surface modification, metal surface alloying, non-metal surface metallization, auxiliary heating, and other process operations. It can simultaneously achieve gas ion source cleaning and auxiliary deposition treatment. Through the DC-superimposed pulsed bias power supply, directional plasma functionality can be realized, which accelerates deposition efficiency while effectively suppressing abnormal arc discharge and improving film quality.
2026-08-15